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Article Dans Une Revue Langmuir Année : 2008

Cheap and Robust Ultraflat Gold Surfaces Suitable for High-Resolution Surface Modification

Résumé

A simple procedure to elaborate robust ultraflat gold surface without clean room facilities is presented. Self-assembled 3-mercaptopropytriethoxysilane (MPTMS) on silicon was used as a buffer layer on which gold was sputtered using a common sputter-coating apparatus. The optimization of the sample position into the chamber of the sputtering machine yielded the formation of a thin (∼8 nm) gold layer. The characterization of the resulting gold surface (i.e., AFM, X-ray reflectivity, and diffraction) has demonstrated its high smoothness (<0.7 nm) over a large scale with a preferred (111) orientation. The robustness of the substrate toward organic solvents and thermal treatment was also tested. The ability of these surfaces to be used as substrates for high-resolution surface modification was confirmed by functionalizing the gold surface using the dip pen nanolithography process.

Dates et versions

hal-02354287 , version 1 (07-11-2019)

Identifiants

Citer

Bruno Pattier, Jean-François Bardeau, Mathieu E Edely, Alain Gibaud, N. Delorme. Cheap and Robust Ultraflat Gold Surfaces Suitable for High-Resolution Surface Modification. Langmuir, 2008, 24 (3), pp.821-825. ⟨10.1021/la702777k⟩. ⟨hal-02354287⟩

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